Phase shift mask and method for fabricating the same

Details Phase shift mask and method for fabricating the same Phase shift mask and method for fabricating the same

1995-10-11

1998-01-06

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, G03F 900

Patent

active

057053006

ABSTRACT:
A phase shift mask having a uniform thickness at a phase shift region. The phase shift mask includes a quartz substrate provided with a plurality of grooves, a chromium pattern coated over the grooves and every other portion of the quartz substrate disposed between the grooves, and a phase shift material pattern coated over the portion of the quart substrate not covered with the chromium pattern, the phase shift material pattern overlapping with the portions of the chromium pattern disposed at opposite sides of the portion of the quartz substrate not covered with the chromium pattern. This phase shift mask is fabricated by forming the chromium pattern such that it is flush with the quartz substrate at its edge. By this phase shift mask, it is possible to prevent the phase shift material pattern overlapping with the chromium pattern from having a non-uniform thickness due to the topology of the chromium pattern.

REFERENCES:
patent: 5437947 (1995-08-01), Hur et al.
patent: 5543254 (1996-08-01), Kim et al.

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