Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1996-06-28
1998-12-15
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430322, G03F 900
Patent
active
058494383
ABSTRACT:
A phase shift mask capable of improving the profile of a photoresist film pattern to be formed, thereby achieving an easy formation of micro patterns to fabricate highly-integrated semiconductor devices, and a method for forming the phase shift mask. The phase shift mask includes a transparent substrate, a light shield film pattern formed on the transparent substrate, the light shield film pattern having alternately-arranged lines and spaces respectively having desired dimensions, a first phase shift film pattern formed on the light shield film pattern and provided with alternately-arranged lines and spaces, the first phase shift film pattern having a larger line width than that of the light shield film pattern, and a second phase shift film pattern formed on a portion of the transparent substrate occupied by the spaces of the first phase shift film pattern.
REFERENCES:
patent: 5322749 (1994-06-01), Han
patent: 5328786 (1994-07-01), Miyazaki et al.
patent: 5366963 (1994-11-01), Hanyu et al.
patent: 5465859 (1995-11-01), Chapple-Sokol et al.
patent: 5484672 (1996-01-01), Bajuk et al.
patent: 5536603 (1996-07-01), Tsuchiya et al.
Hyundai Electronics Industries Co,. Ltd.
Rosasco S.
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