Phase shift mask and method for fabricating the same

Details Phase shift mask and method for fabricating the same Phase shift mask and method for fabricating the same

1995-03-21

1996-11-19

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430322, 430324, G03F 900

Patent

active

055761240

ABSTRACT:
A phase shift mask capable of achieving a variation in phase at the boundary between a light transmitting film and a phase shift film and thereby preventing formation of an undesirable pattern, and a method for fabricating the phase shift mask. The phase shifter has an inclined edge portion disposed at a boundary between the light transmitting film and the light shielding film. The method includes the steps of implanting impurity ions in the phase shifter and etching the phase shifter in a manner that the phase shifter is formed with an inclined edge portion at the boundary between the light transmitting film and the light shielding film.

REFERENCES:
patent: 5208125 (1993-05-01), Lourey et al.
patent: 5281500 (1994-01-01), Cathey et al.

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