Phase shift mask and manufacturing method thereof

Details Phase shift mask and manufacturing method thereof Phase shift mask and manufacturing method thereof

1995-11-15

1997-08-26

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430314, G03F 900

Patent

active

056609558

ABSTRACT:
A phase shift mask is disclosed, which includes a substrate, a plurality of first light shading film pairs formed at an interval on the substrate, a plurality of phase shift layers formed on the first light shading film pairs, and a plurality of second light shading pairs formed on portions of the substrate exposed between the first light shading film pairs. A manufacturing method of a phase shift mask also is disclosed, which includes the steps of providing a substrate, forming a plurality of first light shading film pairs at an interval on the rear side of the substrate, forming a plurality of phase shift layers on the plurality of first light shading film pairs, and forming a plurality of second light shading film pairs between the plurality of first light shading film pairs. The mask and its manufacturing methods may improve the process by addressing the difference in transmitted optical intensities resulting from the refractive indices and optical transmissivities of the various layers.

REFERENCES:
patent: 5429896 (1995-07-01), Hasegawa et al.
patent: 5541025 (1996-07-01), Oi et al.

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