Phase shift mask and its manufacturing method

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

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Details

430296, 430322, 430323, 430394, G03F 900

Patent

active

055276474

ABSTRACT:
A method for manufacturing a phase shift mask of the invention comprises a process of protecting a side wall of an opening in a light-damping film by means of a resist and then etching the light-damping film to be so thin as a halftone film.

REFERENCES:
patent: 4890309 (1989-12-01), Smith et al.
patent: 5380609 (1995-01-01), Fujita et al.

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