Phase shift mask and fabrication method thereof

Details Phase shift mask and fabrication method thereof Phase shift mask and fabrication method thereof

1996-05-10

1999-01-12

Nguyen, Nam

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

058585770

ABSTRACT:
A phase shift mask comprises a light transmitting substrate; a light shelding layer comprising an inorganic material formed on the light transmitting substrate; and a phase transition layer formed on the light shielding layer.

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