Phase shift mask and fabricating method thereof

Details Phase shift mask and fabricating method thereof Phase shift mask and fabricating method thereof

1996-05-15

1998-07-28

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

057861110

ABSTRACT:
A phase shift mask comprising a light transmitting substrate, a light shift layer formed on the light transmitting substrate, the light phase shift layer including a light transmitting region of a first thickness and a phase transition region of a second thickness and a slanted region of a non-uniform thickness extending from the phase transition region; and a light shielding layer covering the slanted region.

REFERENCES:
patent: 5300377 (1994-04-01), Keum
patent: 5487962 (1996-01-01), Rolfson

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