Phase shift mask

Details Phase shift mask Phase shift mask

2008-07-14

2010-12-07

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S005000

Reexamination Certificate

active

07846625

ABSTRACT:
A phase shift mask includes a substrate including first and second transmissive regions alternately disposed, and absorbers disposed on a surface of the substrate such that each absorber is sandwiched between the first and second transmissive regions. A phase shifter is defined by a difference between a surface height of the first transmissive region and a surface height of the second transmissive region. At least the first transmissive region among the first and second transmissive regions has a trench. An aperture portion formed between opposite side walls of respective adjacent absorbers has a width that increases along a depth direction of the substrate. Each trench has a width that increases along the depth direction of the substrate.

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IEEE Transaction on Electron Devices, vol. ED-29, No. 12, Dec. 1982, pp. 1828-1836.

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