Phase shift mask

Details Phase shift mask Phase shift mask

2006-03-07

2006-03-07

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07008734

ABSTRACT:
A phase shift mask, comprising a transparent substrate having a trench-type guard ring pattern for shifting the phase of light transmitted therethrough by 180°; and a half-tone phase shift pattern disposed on the transparent substrate and surrounded by the guard ring pattern is disclosed.

REFERENCES:
patent: 5795682 (1998-08-01), Garza

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