Phase shift mask

Details Phase shift mask Phase shift mask

1995-09-08

1997-08-19

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, G03F 900

Patent

active

056586965

ABSTRACT:
A phase shift mask, having a vernier or box-in-box pattern in an area corresponding to the scribe line of a wafer, allowing the degree of overlap between the light screen pattern and the phase shift film pattern to be accurately examined during wafer processing, whereby the product yield and the reliability can be much improved.

REFERENCES:
patent: 5262258 (1993-11-01), Yanagisawa
patent: 5538819 (1996-07-01), DeMarco et al.

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