Phase shift mask

Details Phase shift mask Phase shift mask

1995-03-21

1996-12-10

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430394, G03F 900

Patent

active

055829384

ABSTRACT:
A phase shift mask capable of preventing the formation of a ghost image caused by diffraction and interference of light with the phase of 0.degree. and light with the phase of 180.degree. meeting upon forming a pattern by use of the mask of the Half-tone type mask. The phase shift mask includes a photoresist film pattern having a light transmitting portion and a light shielding portion, a phase shift layer adapted to shift the phase of light passing through the light shielding portion of the photoresist film pattern, and an assistant pattern adapted to remove unnecessary components of a main waveform of the light, which components are formed due to the diffraction of light at opposite sides of the main light waveform, the assistant pattern being comprised of a light transmitting portion for shifting the phase of a light incident thereon to 0.degree..

REFERENCES:
patent: 5424154 (1995-06-01), Borodovsky
patent: 5427876 (1995-06-01), Miyazaki et al.
patent: 5429897 (1995-07-01), Yoshioka et al.

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