Phase shifiting mask and method of manufacturing the same

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

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G03F 900

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active

058244395

ABSTRACT:
A phase shifting mask includes a transparent substrate having a groove; a light-shading layer formed within the groove to shade an incident light; and a phase shifting layer formed on the light-shading layer and a portion of the transparent substrate for shifting a phase of the incident light.

REFERENCES:
patent: 5290647 (1994-03-01), Miyazaki et al.
patent: 5300378 (1994-04-01), Minami
patent: 5300379 (1994-04-01), Dao et al.
patent: 5437947 (1995-08-01), Hur et al.
patent: 5705300 (1998-01-01), Bae

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