Phase separation in patterned structures

Details Phase separation in patterned structures Phase separation in patterned structures

2006-07-05

2011-11-15

Vinh, Lan (Department: 1713)

Coating processes

Nonuniform coating

C427S258000, C427S058000, C438S052000, C438S674000, C438S647000, C438S626000, C438S962000

Reexamination Certificate

active

08057857

ABSTRACT:
Novel phase-separation behavior by a mixture, including binary mixture, of patterning compounds, including alkanethiols, when deposited onto a surface, including a gold surface, using micro and nano-deposition tools such as tip and stamp methods like micro-contact printing (μCP), and Dip-Pen Nanolithography (DPN). This behavior is significantly different than that observed in the bulk. This behavior was demonstrated using three examples of compounds: 16-mercaptohexadecanoic acid (MHA), 1-octadecanethiol (ODT), and CF3(CF2)11(CH2)2SH (PFT). The identity of the resulting segregated structure was confirmed by lateral force microscopy (LFM), and by selective metal-organic coordination chemistry. This phenomenon is exploited to print sub-100 nm wide alkanethiol features via conventional μCP and to form sub-15 nm features using DPN printing, which is below the ultimate resolution of both these techniques. These nano-patterned materials also can serve as templates for constructing more complex architectures.

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