Phase measurement apparatus for measuring characterization...

Optics: measuring and testing – By light interference – Having wavefront division

Reexamination Certificate

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C356S503000

Reexamination Certificate

active

07030998

ABSTRACT:
A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.

REFERENCES:
patent: 5995224 (1999-11-01), de Groot
patent: 6072581 (2000-06-01), Stephenson et al.
patent: 6469788 (2002-10-01), Boyd et al.
patent: 2003/0142322 (2003-07-01), Sato
patent: 58-16216 (1983-01-01), None
patent: 2000-97620 (2000-04-01), None
European Search Report, dated Dec. 16, 2003.
Zhengquan, et al. “At-wavelength metrology of 13nm lithography imaging optics” Review of Scientific Instruments, Feb. 1995.
Visser, et al. “A Shearing Interferometer to characterize EUV optics with a laser plasma source” The International Society for Optical Engineering, p. 733-734, Mar. 2000.
Hegeman, et al. “Experimental study of a shearing interferometer concept for at-wavelength characterization of extreme-ultraviolet optics” Applied Optics, vol. 40, No. 25, pp. 4526-4533, Sep. 1, 2001.
European Search Report, dated Sep. 18, 2003.

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