Phase mask for use in holographic apparatus

Details Phase mask for use in holographic apparatus Phase mask for use in holographic apparatus

1975-04-28

1976-12-07

Stern, Ronald J.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

350314, 427165, 426240, 428141, G03H 116, G02B 502

Patent

active

039959481

ABSTRACT:
A phase mask for use in a holographic apparatus comprising a combination of phase mask and data mask and being so devised that an illuminant beam transmitting these masks is irradiated on a Fourier transform plane together with a reference beam coherent with said illuminant bean, said phase mask being composed of a transparent plate and random undulations formed on the surface of said transparent plate by coating a solution of high molecular weight compound by means of a spin coater.

REFERENCES:
patent: 3212920 (1965-10-01), Chapman
patent: 3604778 (1971-09-01), Burckhardt
patent: 3829193 (1974-08-01), Tsunoda et al.
patent: 3839067 (1974-10-01), Sosnowski et al.

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