Patent
1986-10-21
1988-07-26
Wan, Gene
35016223, G02B 518
Patent
active
047596074
ABSTRACT:
A combination pattern-refraction modification type phase grating comprises dual grating elements which are regularly arranged and each includes convex and concave portions which have respectively different thickness and are formed of material respectively different in refractive index so as to combine respective characteristics of a pattern and a refraction modification type phase grating.
REFERENCES:
patent: 3911479 (1975-10-01), Sakurai
patent: 4568147 (1985-02-01), Seymour et al.
patent: 4598977 (1986-07-01), Kobayashi
Kawatsuki Nobuhiko
Uetsuki Masao
Kuraray Co. Ltd.
Toshiba Corp.
Wan Gene
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