Phase edge phase shift mask enforcing a width of a field...

Details Phase edge phase shift mask enforcing a width of a field... Phase edge phase shift mask enforcing a width of a field...

2006-08-29

2006-08-29

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07097949

ABSTRACT:
A phase edge phase shift mask and a fabrication method thereof for enforcing a width of a field gate image located on a field region, which is weakened by a two exposure process, by using a phase shift mask and a trim mask on a semiconductor substrate, and enforcing a width of the field gate image to maximize a current driving capability of the semiconductor device.

REFERENCES:
patent: 6593038 (2003-07-01), Cho et al.
patent: 6749971 (2004-06-01), Lukanc et al.
patent: 6787271 (2004-09-01), Cote et al.
patent: 2002/0188924 (2002-12-01), Pierrat et al.
patent: 2004/0043305 (2004-03-01), Park et al.
patent: 2004/0076891 (2004-04-01), Pierrat

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