X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1997-01-08
1998-02-03
Wong, Don
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 4, 378 70, G21K 106
Patent
active
057152918
ABSTRACT:
A phase-contrast X-ray CT apparatus is provided with an X-ray source for generating an X-ray beam, a crystal for generating a diffracted beam by irradiation with the X-ray beam, an object arranging section provided in the direction of propagation of the diffracted beam so that it is rotatable relative to the diffracted beam, an analyzer crystal for receiving a beam transmitted through the object arranging section to extract only a specified refraction angle component, and a sensor for detecting a beam extracted by the analyzer crystal.
REFERENCES:
patent: 5173928 (1992-12-01), Momose et al.
patent: 5259013 (1993-11-01), Kuriyama et al.
A. Momose, et al., Rev. Sci. Instrum. 66 (2), Feb. 1995, pp. 1434-1436.
Nuclear Instruments & Methods in Physics Research, A 352 (1995), pp. 622-628, A. Momose.
T.J. Davis, D. Gao, T.E. Gureyev, A.W. Stevenson and S.W. Wilkins, Phase-Contrast Imaging of Weakly Absorbing Materials Using Hard X-Rays, Letters to Nature, vol. 373, Feb. 16, 1995, pp. 595-597.
T.J. Davis and A.W. Stevenson, Direct Measure of the Phase Shift of An X-Ray Beam, Journal of Optical Society of America, vol. 13, No. 6, Jun. 1996, pp. 1193-1198.
Hitachi , Ltd.
Wong Don
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