PH adjusted nonionic surfactant-containing alkaline cleaner comp

Details PH adjusted nonionic surfactant-containing alkaline cleaner comp PH adjusted nonionic surfactant-containing alkaline cleaner comp

1994-04-20

1995-11-14

Lieberman, Paul

Compositions

Compositions containing a single chemical reactant or plural...

Organic reactant

252102, 252173, 25217421, 134 2, 134 42, C11D 706, C11D 708, C11D 166, C23G 114

Patent

active

054663890

ABSTRACT:
Aqueous alkaline cleaning solutions for cleaning microelectronic substrates and maintaining substrate surface smoothness comprise a metal ion free base, a nonionic surfactant and a component to reduce or control the pH of the cleaning solution to a pH within the range of from about pH 8 to about pH 10.

REFERENCES:
patent: 4039371 (1977-08-01), Brunner et al.
patent: 4113551 (1978-09-01), Bassous et al.
patent: 4239661 (1980-12-01), Muraoka et al.
patent: 4339340 (1982-07-01), Muraoka et al.
patent: 4710449 (1987-12-01), Lewis et al.
patent: 4784937 (1988-11-01), Tanaka et al.
patent: 4833067 (1989-05-01), Tanaka et al.
patent: 4964919 (1990-10-01), Payne
patent: 5185235 (1993-02-01), Sato et al.
patent: 5207866 (1993-05-01), Lue et al.
patent: 5259888 (1993-11-01), McCoy
J. M. Grant et al. "Characterization of rapid thermally grown dielectrics by surface charge analysis and atomic force microscopy", SPIE vol. 2091, pp. 51-62 (1993).
J. J. Kim et al., "Cleaning Process for Removing of Oxide Etch Residue" Electrochemical Society Proceedings, vol. 92-21, pp. 408-415 (1992).
S. D. Hossain et al. "Heated Sci Solution for Selective Etching and Resist Particulate Removal" J. Electrochem. Soc. Vol. 140, No. 12, pp. 3604-3606, Dec. 1993.
W. Kern, "Cleaning Solutions Based on Hydrogen Peroxide for Use in Silicon Semiconductor Technology" RCA Review, pp. 187-206, Jun. 1970.
W. Kern, "Radiochemical Study of Semiconductor Surface Contamination" RCA Review, pp. 207-233, Jun. 1970.

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