Perpendicular pole structure and method of fabricating the same

Details Perpendicular pole structure and method of fabricating the same Perpendicular pole structure and method of fabricating the same

2007-10-16

2007-10-16

Tugbang, A. Dexter (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603130, C029S603160, C029S603180, C216S022000, C216S044000, C216S067000

Reexamination Certificate

active

10883336

ABSTRACT:
A magnetic structure, such as a pole tip, and method for forming the same includes forming a pole tip layer of magnetic material. A layer of polyimide precursor material is added above the pole tip layer and cured. A silicon-containing resist layer is added above the layer of polyimide precursor material and patterned. The resist layer is exposed to oxygen plasma for converting the resist into a glass-like material. Exposed portions of the cured polyimide precursor material are removed for exposing portions of the pole tip layer. The exposed portions of the pole tip layer are removed for forming a pole tip. Chemical mechanical polishing (CMP) can then be performed to remove any unwanted material remaining above the pole tip.

REFERENCES:
patent: 5318877 (1994-06-01), Ober et al.
patent: 2004/0103524 (2004-06-01), Breyta et al.
patent: 1-214026 (1989-08-01), None
Takano et al., “A Study on the Field of Distribution of Thin-Film Heads”, IEEE Transactions on Magnetics, vol. 28, No. 2, Mar. 1992, pp. 1024-1030.

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