Perpendicular head with trailing shield and rhodium gap process

Details Perpendicular head with trailing shield and rhodium gap process Perpendicular head with trailing shield and rhodium gap process

2005-08-01

2008-10-28

Kim, Paul D (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603130, C029S603150, C029S603180, C205S119000, C205S122000, C360S122000, C360S317000, C451S005000, C451S041000

Reexamination Certificate

active

07441325

ABSTRACT:
A perpendicular write head including a main pole and a trailing shield, the main pole being made of a diamond-like carbon (DLC) layer as hard mask and a rhodium (Rh) layer as shield gap, both DLC and Rh layers being CMP stop layers so as to avoid corner rounding and damage from chemical mechanical planarization (CMP) process, the DLC layer being removed by reactive ion etching (RIE) to create a trench, the trailing shield being deposited into the trench for self alignment.

REFERENCES:
patent: 4656546 (1987-04-01), Mallory
patent: 4803580 (1989-02-01), Mowry
patent: 5315469 (1994-05-01), McNeil
patent: 5475550 (1995-12-01), George
patent: 6791793 (2004-09-01), Chen et al.
patent: 6940693 (2005-09-01), Lille et al.
patent: 6967823 (2005-11-01), Nakamoto et al.
patent: 2005/0024771 (2005-02-01), Le

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