Periphery exposing method and apparatus therefor

Details Periphery exposing method and apparatus therefor Periphery exposing method and apparatus therefor

1991-05-02

1994-11-01

McCamish, Marion E.

Photocopying

Projection printing and copying cameras

Original moves continuously

355 53, 355 68, G03B 2742, G03B 2748, G03B 2750

Patent

active

053611217

ABSTRACT:
Prior to a periphery exposing operation, a light emitting unit and a light receiving unit are retracted to a position separate from a wafer, and a calibrating operation is conducted in the retracted position utilizing a light shield plate different from the wafer to be exposed, thereby obtaining a servo control reference signal for the exposure. At the exposure of the periphery portion of the wafer, the exposure width is controlled according to the reference signal. It is therefore rendered possible to achieve exact peripheral exposure, including the intensity and intensity distribution of the exposing light beam immediately before the irradiation of the peripheral portion of the wafer.

REFERENCES:
patent: 4899195 (1990-02-01), Gotoh
patent: 4910549 (1990-03-01), Sugita
patent: 5028955 (1991-07-01), Hayashida
patent: 5229811 (1993-07-01), Hattori

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