Peripheral edge exposure method

Details Peripheral edge exposure method Peripheral edge exposure method

1996-08-01

1998-09-22

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, 430322, 430327, 382145, G03C 500

Patent

active

058112111

ABSTRACT:
A photosensitive substrate is exposed with both a peripheral edge exposure apparatus which exposes the peripheral portion of the photosensitive substrate in a specified exposure width and a pattern exposure apparatus which transfers a scale pattern to the photosensitive substrate so that a dimension from the outer periphery of the photosensitive substrate is known. The accuracy (offset quantity) of the exposure width of the peripheral edge exposure apparatus is evaluated by reading out the resist image of the scale pattern which appears on the substrate after development.

REFERENCES:
patent: 4899195 (1990-02-01), Gotoh
patent: 4910549 (1990-03-01), Sugita
patent: 5168304 (1992-12-01), Hattori
patent: 5229811 (1993-07-01), Hattori et al.
patent: 5250983 (1993-10-01), Yamamura
patent: 5439764 (1995-08-01), Alter et al.
patent: 5650250 (1997-07-01), Moon

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