Perimeter wafer seal

Details Perimeter wafer seal Perimeter wafer seal

1989-05-18

1990-06-12

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Work support

118500, 118721, 4272481, 427282, C23C 1600

Patent

active

049323580

ABSTRACT:
A seal ring presses against a wafer on a CVD chuck continuously around the outer periphery of the wafer, and with sufficient force to hold the backside of the wafer against the chuck, so no CVD material may deposit on the backside of the wafer. The seal ring has one surface for contacting the frontside of the wafer and a second surface that extends close to the CVD chuck, so the edge of the wafer is also excluded from CVD coating. With use of the wafer seal ring apparatus and method, CVD coating is confined to the frontside of a wafer. In a preferred embodiment, an apparatus with a slide operated by a cam lever and a tension spring for moving the seal ring and pressing it against a wafer on a CVD chuck is used with each of multiple chucks attached to a rotatable turret within a CVD chamber.

REFERENCES:
patent: 3897324 (1975-07-01), Del Monte et al.
patent: 4113547 (1978-09-01), Katz et al.
patent: 4373470 (1983-02-01), Martin
patent: 4592308 (1986-06-01), Shih et al.
patent: 4599970 (1986-07-01), Peterson
patent: 4676193 (1987-06-01), Martin
patent: 4777909 (1988-10-01), Martin

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