Performing OPC on structures with virtual edges

Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement

Reexamination Certificate

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C430S005000

Reexamination Certificate

active

07459248

ABSTRACT:
A method for compensating for optical distortions occurring in regions associated with non-phase-shifting regions in a mask or reticle. OPC or other resolution enhancement techniques are performed on one or more edge segments associated with adjacent phase-shifting regions in order to compensate for edge position errors occurring in areas corresponding to non-phase-shifting regions.

REFERENCES:
patent: 4762396 (1988-08-01), Dumant et al.
patent: 5502654 (1996-03-01), Sawahata
patent: 5655110 (1997-08-01), Krivokapic et al.
patent: 5723233 (1998-03-01), Garza et al.
patent: 5825647 (1998-10-01), Tsudaka
patent: 5879844 (1999-03-01), Yamamoto et al.
patent: 6016357 (2000-01-01), Neary et al.
patent: 6049660 (2000-04-01), Ahn et al.
patent: 6077310 (2000-06-01), Yamamoto et al.
patent: 6120952 (2000-09-01), Pierrat et al.
patent: 6128067 (2000-10-01), Hashimoto
patent: 6187483 (2001-02-01), Capodieci et al.
patent: 6243855 (2001-06-01), Kobayashi et al.
patent: 6249904 (2001-06-01), Cobb
patent: 6263299 (2001-07-01), Aleshin et al.
patent: 6269472 (2001-07-01), Garza et al.
patent: 6317859 (2001-11-01), Papadopoulou
patent: 6370679 (2002-04-01), Chang et al.
patent: 6425117 (2002-07-01), Pasch et al.
patent: 6453452 (2002-09-01), Chang et al.
patent: 6453457 (2002-09-01), Pierrat et al.
patent: 6467076 (2002-10-01), Cobb
patent: 6499003 (2002-12-01), Jones et al.
patent: 6665845 (2003-12-01), Aingaran et al.
patent: 6927003 (2005-08-01), Kim et al.
patent: 7017141 (2006-03-01), Anderson et al.
patent: 2006/0236294 (2006-10-01), Saidin et al.
patent: 09319067 (1997-12-01), None
patent: 11-102380 (1999-04-01), None
patent: 2004-502961 (2004-01-01), None
patent: WO 99/14637 (1999-03-01), None
patent: WO 01/65315 (2001-09-01), None
patent: WO 01/97096 (2001-12-01), None
Mentor Graphics Corporation, News & Views, Mar. 1999, <http://www.mentorg.co.jp/N-V/99—3/dsm.html> [retrieved Nov. 7, 2006].
Mentor Graphics Corporation, News & Views, Mar. 1999, <http://www.mentorg.co.jp/N-V/99—3/opc.html> [retrieved Nov. 7, 2006].
Mentor Graphics Corporation, News & Views, Apr. 2000, <http://www.mentorg.co.jp/N-V/00—04/ppower.html> [retrieved Nov. 7, 2006].
Cobb, N., and Y. Granik, “Model-Based OPC Using the MEEF Matrix,”Proceedings of SPIE, vol. 4889:22nd Annual BACUS Symposium on Photomask Technology, Monterey, Calif., Sep. 30-Oct. 4, 2002, p. 147.
Cobb, N., and A. Zakhor, “Experimental Results on Optical Proximity Correction With Variable Threshold Resist Model,”Proceedings of SPIE, vol. 3051:Symposium on Optical Microlithography X, Santa Clara, Calif., Mar. 10-14, 1997, pp. 458-468.
Cobb, N., and A. Zakhor, “Fast, Low-Complexity Mask Design,”Proceedings of SPIE, vol. 2440:Symposium on Optical/Laser Microlithography VIII, Santa Clara, Calif., Feb. 22-24, 1995, pp. 313-327.
Cobb, N., and A. Zakhor, “Fast Sparse Aerial Image Calculation for OPC,”Proceedings of SPIE, vol. 2621:15th Annual BACUS Symposium on Photomask Technology and Management, Santa Clara, Calif., Sep. 20-22, 1995, pp. 534-545.
Cobb, N., and A. Zakhor, “Large Area Phase-Shift Mask Design,”Proceedings of SPIE, vol. 2197:Symposium on Optical/Laser Microlithography VII, San Jose, Calif., Mar. 2-4, 1994, pp. 348-360.
Cobb., N., et al., “Mathematical and CAD Framework for Proximity Correction,”Proceedings of SPIE, vol. 2726:Symposium on Optical Microlithography IX, Santa Clara, Calif., Mar. 13-15, 1996, pp. 208-222.
Cobb, N., and Y. Granik, “Using OPC to Optimize for Image Slope and Improve Process Window,” (Nov. 20, 2002),Proceedings of SPIE, vol. 5130:Photomask Japan, Yokohama, Japan, Apr. 16-18, 2003, p. 42.
Granik, Y., “Generalized MEEF Theory,”Interface 2001, Nov. 2001.
Granik, Y., and N. Cobb, “MEEF as a Matrix,”Proceedings of SPIE, vol. 4562:21st Annual BACUS Symposium on Photomask Technology, Monterey, Calif., Oct. 2-5, 2001, pp. 980-991.
Granik, Y., and N. Cobb, “Two-Dimensional G-MEEF Theory and Applications,”Proceedings of SPIE, vol. 4754:Symposium on Photomask and Next-Generation Lithography Mask Technology IX, Yokohama, Japan, Apr. 23-25, 2002, pp. 146-155.
Maurer, W., et al., “Process Proximity Correction Using an Automated Software Tool,”Proceedings of SPIE, vol. 3334:Optical Microlithography XI, Santa Clara, Calif., Feb. 22-27, 1998, pp. 245-253.
Maurer, W., et al., “Evaluation of a Fast and Flexible OPC Package: OPTISSIMO,”Proceedings of SPIE, vol. 2884:16th Annual Symposium on Photomask Technology and Management, Redwood City, Calif., Sep. 18-20, 1996, pp. 412-418.
Ohnuma, H., et al., “Lithography Computer Aided Design Technology for Embedded Memory in Logic,”Japanese Journal of Applied Physics 37(12B):6686-6688, Dec. 1998.

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