Performance evaluation method for plasma processing apparatus

Details Performance evaluation method for plasma processing apparatus Performance evaluation method for plasma processing apparatus

2005-03-22

2005-03-22

Picard, Leo (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S108000, C700S110000, C700S123000, C324S658000, C324S600000

Reexamination Certificate

active

06871111

ABSTRACT:
A plasma processing apparatus has a plasma processing chamber having a plasma excitation electrode, a radiofrequency generator connected to the plasma excitation electrode, and a matching circuit for matching the impedance between the plasma processing chamber and the radiofrequency generator. The loss capacitance CX1at a later time t1after delivery is measured between the plasma excitation electrode and ground potential positions which are grounded. The performance is evaluated by whether or not the loss capacitance CX1is less than 26 times the plasma electrode capacitance Ce1at the later time t1between the plasma excitation electrode and a counter electrode which cooperate with each other.

REFERENCES:
patent: 5472561 (1995-12-01), Williams et al.
patent: 5936413 (1999-08-01), Booth et al.

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