Perfluoropolymer coated pellicle

Details Perfluoropolymer coated pellicle Perfluoropolymer coated pellicle

1991-05-20

1992-12-01

Ryan, Patrick J.

Stock material or miscellaneous articles

Structurally defined web or sheet

Edge feature

428422, 428412, 428463, B32B 300

Patent

active

051680017

ABSTRACT:
Pellicles having films bearing at least one coating of perfluoropolymers as an antireflective surface, the perfluoropolymers comprising a low molecular weight perfluoropolymer having randomly copolymerized units of tetrafluoroethylene, perfluoro (alkyl vinyl) ether and a cure site monomer, the cure site monomer selected from the group consisting of vinylidene fluoride, perfluoro-(8-cyano-5-methyl-3,6-dioxa-1-octene), bromotetrafluorobutene or perfluoro (2-phenoxypropyl vinyl ether). Pellicles of this type are dust defocusing covers for photomasks and reticles used to project patterns onto light sensitive substrates such as photoresist-coated semiconductor wafers which are used in the manufacture of integrated circuits.

REFERENCES:
patent: 4970099 (1990-11-01), Adams et al.
patent: 5008156 (1991-04-01), Hong
patent: 5061024 (1991-10-01), Keys

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