Perfluoropolyethers containing a halogen different from fluorine

Details Perfluoropolyethers containing a halogen different from fluorine Perfluoropolyethers containing a halogen different from fluorine

1991-01-29

1992-09-01

Niebling, John

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

20415794, 20415788, 568601, 568416, C07C 4101

Patent

active

051435896

ABSTRACT:
Perfluoropolyethers having an acid end group of the type of acyl fluoride (or chloride) or a carboxylic group or derivatives thereof, the other end group being a perfluoroalkyl containing one or two halogen atoms different from fluorine, are prepared by photooxidation of C.sub.3 F.sub.6 and/or C.sub.2 F.sub.4, in the presence of a fully halogenated ethylene containing 1 to 4, preferably 1 or 2 atoms of halogen different from fluorine, and by the subsequent thermal of photochemical decomposition treatment of the peroxide groups which are present in the photooxidation product.

REFERENCES:
patent: 3715378 (1973-02-01), Sianesi et al.
patent: 4451646 (1984-05-01), Sianesi et al.
patent: 4745009 (1988-05-01), Piacenti et al.
patent: 4820588 (1989-04-01), Brinduse et al.
patent: 4855025 (1989-08-01), Gautier et al.
patent: 4859299 (1989-08-01), Kobayashi et al.
patent: 4952735 (1990-09-01), Kobayashi et al.

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