Perfluoroalkyl group-containing copolymers and reproduction laye

Details Perfluoroalkyl group-containing copolymers and reproduction laye Perfluoroalkyl group-containing copolymers and reproduction laye

1985-06-07

1988-02-09

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430 49, 430 96, 430175, 430197, 430281, 430284, 430285, 430165, 430303, G03C 160, G03C 168, G03C 171

Patent

active

047241950

ABSTRACT:
Copolymers comprising perfluoroalkyl groups, reproduction layers containing these copolymers and use thereof for waterless offset printing. The novel perfluoroalkyl group-containing copolymers are prepared from at least two different monomers, monomer (a) comprising acryloyl or methacryloyl groups and phenolic OH groups and monomer (b) comprising acryloyloxy, methacryloyloxy or vinyl groups and a perfluoroalkyl group. Monomer component (a) can, for example, be prepared from a hydroxybenzoic acid by esterification with a hydroxyalkyl-acrylate. The novel copolymers are, in particular, used as binders in radiation-sensitive reproduction layers which additionally contain at least one radiation-sensitive compound. Reproduction layers of this kind are used as radiation-sensitive coatings of support materials for printing plates used in waterless offset printing.

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