Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1987-08-21
1989-06-13
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430166, 430193, 430303, 534557, G03C 154
Patent
active
048392561
ABSTRACT:
Light-sensitive perfluoroalkyl group-containing 1,2-naphthoquinone diazide compounds and reproduction materials comprising a support and a light-sensitive layer containing such compounds useful in producing planographic printing plates for waterless printing. The 1,2-naphthoquinone diazide compounds correspond to the formula I. ##STR1## wherein Ar denotes a mononuclear to trinuclear aromatic radical
REFERENCES:
patent: 3106465 (1963-10-01), Neugebauer et al.
patent: 3148983 (1964-09-01), Endermann et al.
patent: 3511178 (1970-05-01), Curtin
patent: 3677178 (1972-07-01), Gipe
patent: 3682633 (1972-08-01), Curtin
patent: 3711285 (1973-01-01), Deutsch et al.
patent: 3910187 (1975-10-01), Cords
patent: 4024122 (1977-05-01), Ross et al.
patent: 4275139 (1981-06-01), Stahlhofer
patent: 4358522 (1982-11-01), Fujita et al.
patent: 4504567 (1985-03-01), Yamamoto et al.
Bowers Jr. Charles L.
Hoechst Aktiengesellschaft
LandOfFree
Perfluoroalkyl group-containing 1,2-napthoquinone daizide compou does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Perfluoroalkyl group-containing 1,2-napthoquinone daizide compou, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Perfluoroalkyl group-containing 1,2-napthoquinone daizide compou will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1277079