Perfluoride processing apparatus

Details Perfluoride processing apparatus Perfluoride processing apparatus

2005-04-19

2010-02-23

Griffin, Walter D (Department: 1797)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Waste gas purifier

C422S168000, C422S177000

Reexamination Certificate

active

07666365

ABSTRACT:
A plurality of etchers such as poly-etchers3or the like are installed within a clean room2. A duct7that is connected to all the etchers is connected to a PFC decomposition device9, which is installed outside of the clean room2. An exhaust gas which contains PFC as drained out of all the etchers within the clean room2is supplied by the duct7to the inner space of PFC decomposition device9. After having heated up within the PFC decomposition device9, the PFC is decomposed by the action of a catalyst which is filled within the PFC decomposition device9. It is no longer required to provide a space for installation of the PFC decomposition device9in the clean room2with the semiconductor fabrication apparatus or the liquid crystal manufacturing apparatus installed therein, thus enabling size reduction or “downsizing” of the clean room. It is possible to reduce the size of a clean room in which a semiconductor fabricating apparatus or a liquid crystal manufacturing apparatus is installed.

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Machine translation of JP 07246232 A.
Machine translation of JP 07132211 A, which was published on May 23, 1995.

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