Penning type cathode for sputter coating

Details Penning type cathode for sputter coating Penning type cathode for sputter coating

1988-03-21

1989-03-07

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C23C 1434

Patent

active

048103470

ABSTRACT:
A sputter coating system utilizing a Penning type cathode. Inner and outer targets are concentrically oriented about an axis that intersects a substrate spaced from the targets. An electromagnet produces a magnetic field in a region between the substrate and the targets that confines a plasma of ions relative the targets. An annular anode that separates the two targets helps create an electric field that accelerates ions from the plasma to the targets where collisions between the ions and targets cause target material to sputter coat the substrate.

REFERENCES:
patent: 2146025 (1939-02-01), Penning
patent: 3884793 (1975-05-01), Penfold et al.
patent: 4282083 (1981-08-01), Kertesz et al.
patent: 4434038 (1984-02-01), Morrison, Jr.
patent: 4569746 (1986-02-01), Hutchinson
patent: 4604180 (1986-08-01), Hirukawa et al.
patent: 4606806 (1986-08-01), Helmer
patent: 4629548 (1986-12-01), Helmer

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