Penning sputter source

Details Penning sputter source Penning sputter source

1980-02-13

1981-08-04

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

042820839

ABSTRACT:
The invention relates to a Penning sputter source which utilizes the Penning gas discharge for producing thin films by sputtering. The invented device guarantees a great productivity and effectiveness of the sputtering process by means for equalizing the magnetic field over the device and by increasing the surface of the active zone of the device. The produced layers are of equal thickness, can be composed of alloys of required composition and produced also on plastic substrates having low thermostability.

REFERENCES:
patent: 3956093 (1976-05-01), McLeod
patent: 4046660 (1977-09-01), Fraser
patent: 4060470 (1977-11-01), Clarke

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