Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-03-22
2005-03-22
Huff, Mark (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C428S014000
Reexamination Certificate
active
06869733
ABSTRACT:
The present invention is a method of protecting reticles from electrostatic damage during their use in manufacturing lines and while patterning photoresist films on device substrates. An anti-static layer comprised of an ammonium salt is formed on both sides of a pellicle which is then attached to a metal frame that has been coated with an anti-static layer of the ammonium salt. The frame with attached pellicle is connected to a reticle by an adhesive. Any electrostatic charges that form on the surface of the anti-static layers or on the reticle are conducted into the metal frame where they are dissipated. The ammonium salt is preferably (RN4+) Cl— in which (RN4+) has the structure:where Y is an alkyl group or C6H4, m=1 to 10000, and X−is Cl−.
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patent: 5482799 (1996-01-01), Isao et al.
patent: 5533634 (1996-07-01), Pan et al.
patent: 5577610 (1996-11-01), Okuda et al.
patent: 6149992 (2000-11-01), Nakayama
Huff Mark
Mohamedulla Saleha
Taiwan Semiconductor Manufacturing Company
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