Pellicle structure for transmission of mid ultraviolet light

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350582, 350318, G02B 104

Patent

active

047969733

ABSTRACT:
A freely standing thin pellicle film of cellulose acetate buterate is formed by spinning on a rotating substrate. After forming, the film is lifted off of the substrate and secured to a metallic frame. The pellicle is for use in the mid ultraviolet range of 280 to 360 nanometers, but can be used also in the deep ultraviolet range, e.g. wavelengths as low as about 240 nanometers. The pellicle prevents dust particles from being focused on a surface which is to be exposed by the ultraviolet radiation.

REFERENCES:
patent: 4378953 (1983-04-01), Winn
patent: 4476172 (1984-10-01), Ward
patent: 4482591 (1984-11-01), Ward
patent: 4499231 (1985-02-01), Ward
"Pellicles--An Industry Overview", by R. Winn et al., Solid State Technology, vol. 25, No. 6, Jun. 1982, pp. 41-43.
"Pellicle Mask Protection for 1:1 Projection Lithography", by T. A. Brunner et al., Solid State Technology, vol. 26, No. 5, May 1983, pp. 135-143.
"Yield Improvement with Pellicalised Masks in Projection Printing Technology", by A. Rangappan et al., Spie Optical Microlithography, vol. 334, 1982, pp. 52-57.
"A Broadband Deep UV Pellicle for 1:1 Scanning Projection and Step and Repeat Lithography", by H. L. Stover et al., Spie Optical Microlithography III: Technology for the Next Decade, vol. 470, 1984, pp. 147-156.

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