Pellicle, methods of fabrication and methods of use for...

Details Pellicle, methods of fabrication and methods of use for... Pellicle, methods of fabrication and methods of use for...

2006-12-29

2010-02-23

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C428S014000

Reexamination Certificate

active

07666555

ABSTRACT:
Embodiments of a pellicle, methods of fabrication and methods of use in extreme ultraviolet (EUV) photolithography are disclosed. The pellicle may include a wire mesh with a square or hexagonal geometric configuration. A thin film of a material with a high Young's modulus may be coated on at least one surface of the wire mesh. A method of fabrication may include forming at least one sacrificial layer on a surface of the wire mesh, forming a thin film on another surface of the wire mesh, and removing the sacrificial layer to form a pellicle. A method of use may include positioning a pellicle relative to a photomask to protect the photomask from particulate accumulation during an EUV photolithography process.

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Shroff, Y. A., et al., “Development of EUV Pellicle for Reticle Defect Mitigation”, EUVL Symposium 2006, Intel Corporation, Barcelona, (Oct. 18, 2006), 29 pages.
Shroff, et al., “EUV Pellicle Development for Mask Defect Control”, Proc. of SPIE, vol. 6151, (2006), 10 pages.

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