Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1991-04-23
1993-07-20
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
428421, 428422, 428522, 428524, G03F 900
Patent
active
052292290
ABSTRACT:
A pellicle having a reflection-preventing function comprised of a transparent polyvinyl acetal film and a reflection-preventing film formed on at least one surface of the polyvinyl acetal film. The reflection-preventing film is made of a copolymer of a perfluoroalkyl acrylate or methacrylate with a hydroxyalkyl acrylate or methacrylate having (i) a hydroxyalkyl group having 2-3 OH groups on the terminal or side chain and 3-5 carbon atoms, (ii) a hydroxyalkyl group having an OH group on the terminal or side chain and 2-4 carbon atoms, or (iii) a fluorine-containing hydroxyalkyl group having an OH group on the terminal or side chain and 4-12 carbon atoms.
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Sato Shinji
Seita Toru
Sekimoto Kenichi
Shibata Katsuya
Ashton Rosemary
McCamish Marion E.
Tosoh Corporation
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