Pellicle having reflection-preventing function

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

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Details

428421, 428422, 428522, 428524, G03F 900

Patent

active

052292290

ABSTRACT:
A pellicle having a reflection-preventing function comprised of a transparent polyvinyl acetal film and a reflection-preventing film formed on at least one surface of the polyvinyl acetal film. The reflection-preventing film is made of a copolymer of a perfluoroalkyl acrylate or methacrylate with a hydroxyalkyl acrylate or methacrylate having (i) a hydroxyalkyl group having 2-3 OH groups on the terminal or side chain and 3-5 carbon atoms, (ii) a hydroxyalkyl group having an OH group on the terminal or side chain and 2-4 carbon atoms, or (iii) a fluorine-containing hydroxyalkyl group having an OH group on the terminal or side chain and 4-12 carbon atoms.

REFERENCES:
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patent: 4690869 (1987-09-01), Ohmori et al.
patent: 4966813 (1990-10-01), Agou et al.
patent: 4970099 (1990-11-01), Adams et al.
patent: 5008156 (1991-04-01), Hong
patent: 5061024 (1991-10-01), Keys
patent: 5168001 (1992-12-01), Legare et al.

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