Pellicle frame

Details Pellicle frame Pellicle frame

2005-08-16

2009-06-30

Speer, Timothy M (Department: 1794)

Stock material or miscellaneous articles

All metal or with adjacent metals

Composite; i.e., plural, adjacent, spatially distinct metal...

C428S457000, C428S632000, C428S596000, C428S045000

Reexamination Certificate

active

07553551

ABSTRACT:
A pellicle frame for pellicle for use with a photomask in a wafer lithographic processing process is disclosed to have the frame body made of a material containing silver that absorbs sulfide released from other materials of the pellicle, preventing formation of crystals on the mask pattern of the photomask after exposure. In an alternate form, the pellicle frame is made of aluminum alloy, ceramics, or stainless steel, and then coated with a layer of silver and a black coating of polymer, for example, Teflon, PEEK (Polyaryletherketone) or PFA (Perfluoroalkoxy).

REFERENCES:
patent: 5470621 (1995-11-01), Kashida et al.
patent: 6406573 (2002-06-01), Cerio
patent: 2004/0137339 (2004-07-01), Zhang et al.
patent: 2005/0214655 (2005-09-01), Zimmerman et al.
patent: 0 622 680 (1994-11-01), None
patent: 07-072617 (1995-03-01), None

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