Pellicle for lithography

Details Pellicle for lithography Pellicle for lithography

1992-06-19

1993-08-10

Schofer, Joseph L.

Stock material or miscellaneous articles

Structurally defined web or sheet

Edge feature

428220, 428449, 428457, 526279, 359350, B32B 2730

Patent

active

052347427

ABSTRACT:
A pellicle for lithography based on the exposure method especially adapted for lithographic lights having wave lengths of 500 nm or smaller, characterized in that the pellicle film is made of a high polymer organic silicon compound, preferably of a general molecular formula: ##STR1## where R.sup.1, R.sup.2, and R.sup.3 are the same or different alkyl groups having one to eight carbon atoms, and n is an integer between 100 and 40,000.

REFERENCES:
patent: 4378953 (1983-04-01), Winn
patent: 4433044 (1984-02-01), Meyer
patent: 4476172 (1984-10-01), Ward
patent: 4778868 (1988-10-01), Higashimura
patent: 4837386 (1989-06-01), Puri

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