Pellicle film optimized for immersion lithography systems...

Details Pellicle film optimized for immersion lithography systems... Pellicle film optimized for immersion lithography systems...

2007-01-31

2008-08-26

Visconti, Geraldina (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S004000

Reexamination Certificate

active

07416820

ABSTRACT:
An optical pellicle to protect a photomask from particulate contamination during semiconductor lithography is provided which has enhanced transparency and operational characteristics. The pellicle utilizes alternating layers of a transparent polymer and a transparent inorganic layer to form pellicles which have high transmission properties and high strength. In a preferred pellicle, a three-layer pellicle is provided having a transparent inorganic layer sandwiched between two polymer layers. A five-layer pellicle is also provided with the outer layers and a middle layer being polymer layers and the inner layers an inorganic material. The preferred polymer layer is a perfluorinated polymer such as Teflon® and the preferred inorganic material is silicon dioxide. The pellicle of the invention provides light transmission of greater than 0.99% at incident light angles up to arcsine 0.45.

REFERENCES:
patent: 5723860 (1998-03-01), Hamada et al.
patent: 5757126 (1998-05-01), Harvey, III et al.
patent: 5772817 (1998-06-01), Yen et al.
patent: 6190743 (2001-02-01), Wang
patent: 6280886 (2001-08-01), Yan
patent: 6475575 (2002-11-01), Ikuta et al.
patent: 6824930 (2004-11-01), Wheland et al.
patent: 2002/0127360 (2002-09-01), Kurata et al.
patent: 2003/0096178 (2003-05-01), Fujita et al.
patent: 2005/0042524 (2005-02-01), Bellman
patent: 2005/0214655 (2005-09-01), Zimmerman et al.
patent: 06222551 (1994-12-01), None
patent: 2005070120 (2005-03-01), None

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