Pellicle assembly with vent structure

Details Pellicle assembly with vent structure Pellicle assembly with vent structure

1995-04-17

1996-06-25

Thomas, Alexander S.

Stock material or miscellaneous articles

Display in frame or transparent casing; or diorama including...

Peripheral enclosure or frame

428131, 355 30, G03F 100, G03F 900

Patent

active

055298192

ABSTRACT:
A pellicle for isolating a photomask pattern from particulate contaminants. The pellicle includes a peripheral frame having at least one vent structure for the passage of a gaseous substance between the interior of the frame and the atmosphere outside of the frame. The vent structure is configured for removal of particulate contaminants from the gaseous substance before the gaseous substance flows into the interior of the frame. The vent structure includes at least one exterior passageway extending between two openings in the outer surface of the frame and at least one interior passageway extending inwardly from the exterior passageway to an opening in the inner surface of the frame.

REFERENCES:
patent: 4697701 (1987-10-01), Ying
patent: 4737387 (1988-04-01), Yin
patent: 4833051 (1989-05-01), Imamura
patent: 5305878 (1994-04-01), Yen
patent: 5344677 (1994-09-01), Hong

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