Pellicle

Details Pellicle Pellicle

2005-11-01

2005-11-01

Zacharia, Ramsey (Department: 1773)

Stock material or miscellaneous articles

Two dimensionally sectional layer

With frame, casing, or perimeter structure

C428S421000, C359S350000, C359S507000

Reexamination Certificate

active

06960381

ABSTRACT:
A pellicle is used for a photolithographic patterning process using a light having a wavelength of from 100 to 200 nm. The pellicle contains a pellicle membrane containing (A) a substantially linear fluoropolymer which has an alicyclic structure in its main chain, the main chain being a chain of carbon atoms, and the fluropolymer satisfying the following requirements (1) the carbon atoms in the main chain of the fluoropolymer contain a carbon atom having at least one hydrogen atom bonded thereto and a carbon atom having no hydrogen atom bonded thereto; and (2) in the measurement of a high resolution proton magnetic resonance spectrum of the fluoropolymer, a number of hydrogen atoms based on signals appearing on the higher magnetic field side higher than 2.8 ppm, is at most 6 mol % based on a total number of hydrogen atoms.

REFERENCES:
patent: 5061024 (1991-10-01), Keys
patent: 6548129 (2003-04-01), Matsukura et al.
patent: 2001/0024701 (2001-09-01), Matsukura et al.
patent: WO 01/37043 (2001-05-01), None
patent: WO 01/37044 (2001-05-01), None
“Polymer Synthetic Chemistry”, published on Aug. 10, 1995. pp. 14-15.
English translation of relevant portions of “Polymer Synthetic Chemistry”.

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