Radiation imagery chemistry: process – composition – or product th – Stripping process or element – Element
Patent
1994-05-26
1995-02-28
Baxter, Janet C.
Radiation imagery chemistry: process, composition, or product th
Stripping process or element
Element
430143, 430166, 430167, 430259, 430271, 430293, G03F 7105, G03F 711
Patent
active
053936400
ABSTRACT:
A photosensitive material either comprises a support, a peel layer, a barrier layer and a coloring material-containing photosensitive layer or a laminate of a coloring material layer and a photosensitive layer, superposed in order, or comprises a support having a releasing surface, an intermediate layer instead of both the peel layer and the barrier layer as mentioned above, a coloring material-containing photosensitive layer or a laminate of a coloring material layer and a photosensitive layer, superposed in order. The barrier layer or the intermediate layer comprises a polymer having a glass transition temperature not higher than 70.degree. C. which is selected from the group consisting of a homopolymer of an acrylate monomer having an aromatic ring, a methacrylate monomer having an aromatic ring, an acrylamide monomer having an aromatic ring or a methacrylamide monomer having an aromatic ring, a copolymer of two or more of these monomers, and a copolymer of 50 molar % or more of one or more of these monomers and 50 molar % or less of one or two of other copolymerizable monomers.
REFERENCES:
patent: 4797343 (1989-01-01), Nakamura
patent: 5002850 (1991-03-01), Shinozaki et al.
Niitsu Chiyomi
Wakata Yuichi
Baxter Janet C.
Fuji Photo Film Co. , Ltd.
Young Christopher G.
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