Peel-apart photosensitive elements and their process of use

Details Peel-apart photosensitive elements and their process of use Peel-apart photosensitive elements and their process of use

1997-09-25

1999-12-14

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

Forming nonplanar image

430260, 430262, 430263, G03C 1805, G03C 1112

Patent

active

060015322

ABSTRACT:
A peel-apart photosensitive element comprising in order: a strippable cover sheet; a photosensitive layer; an essentially non-photosensitive, non-tacky organic layer comprised of block or random polymers of at least one aromatic polymer and at least one non-aromatic monomer; and a support, wherein the photosensitive layer has a lowered peel force in relation to the cover sheet after exposure to actinic radiation.

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U.S. Patent application Ser. No. 08/937,825 filed Sep. 25, 1997.

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