Peel-apart photosensitive elements and their process of use

Details Peel-apart photosensitive elements and their process of use Peel-apart photosensitive elements and their process of use

1997-09-25

1999-10-12

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

Forming nonplanar image

430260, 430262, 430263, G03C 1805, G03C 1112

Patent

active

059653213

ABSTRACT:
An element containing, in order: a first strippable substrate; a substantially transparent, non-photosensitive, polymeric isolation layer having a coating weight of 10 to 150 mg/dm.sup.2 ; an essentially non-photosensitive, non-tacky organic layer having a coating weight of 25 to 200 mg/dm.sup.2 ; a pigmented photosensitive, preferably photopolymerizable layer; and a second different strippable substrate adjacent the photosensitive layer, wherein the photosensitive layer upon imagewise exposure to actinic radiation exhibits a lowered peel force relative to a system which does not have a polymeric isolation layer.

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