Peel-apart-developable light-sensitive materials and image-formi

Details Peel-apart-developable light-sensitive materials and image-formi Peel-apart-developable light-sensitive materials and image-formi

1979-12-03

1981-08-18

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Process producing multiple image

430143, 430158, 430159, 430162, 430167, 430253, 430254, 430273, 430945, G03C 508, G03C 518

Patent

active

042847036

ABSTRACT:
A peel-apart-developable light-sensitive material comprising a light-sensitive element (a) comprising (i) a first support having coated thereon (ii) a thin layer and (iii) a light-sensitive composition layer in this order, in combination with an adhesive element (b) comprising (i) a second support having coated thereon (ii) an adhesive composition layer, wherein the thin layer (ii) has a different composition from the composition of the light-sensitive layer (iii) and having the capability that, where the light-sensitive composition layer (iii) is imagewise exposed to actinic radiation and then one of the first support (i) or the second support (i) is peeled from the combination of the light-sensitive element (a) and the adhesive element (b) laminated together in which the light-sensitive composition layer (iii) is adjacent the adhesive composition layer (ii), all of or a portion of the thin layer (ii) is peeled off with the second support (i), the adhesive composition layer (ii) and the light-sensitive composition layer (iii) with the thin layer (ii) being adhered selectively to the light-sensitive composition layer (iii) in correspondence with the imagewise exposure, and a method for forming images using the same.

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Chemical Abstracts, vol. 77, Abstract 95357y, 1972.

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