Patterning of mechanical layer in MEMS to reduce stresses at...

Details Patterning of mechanical layer in MEMS to reduce stresses at... Patterning of mechanical layer in MEMS to reduce stresses at...

2008-07-29

2008-07-29

Schwartz, Jordan M. (Department: 2873)

Optical: systems and elements

Optical modulator

Light wave temporal modulation

C359S245000

Reexamination Certificate

active

07405863

ABSTRACT:
A method of fabricating a MEMS device includes the formation of support posts having horizontal wing portions at the edges of the post. A mechanical layer is deposited over the support posts and portions of the mechanical layer overlying portions of the support post other than the horizontal wing portions are etched away. A resultant MEMS device includes a mechanical layer overlying at least a portion of the horizontal wing portions of the underlying support structures.

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