Patterning methods and systems using reflected interference...

Details Patterning methods and systems using reflected interference... Patterning methods and systems using reflected interference...

2005-11-22

2005-11-22

Angebranndt, Martin (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Holographic process, composition, or product

C430S002000, C430S322000, C351S064000, C351S064000

Reexamination Certificate

active

06967067

ABSTRACT:
A method for patterning a layer on a substrate can include projecting coherent radiation toward a reflector surface so that the coherent radiation is reflected off the reflector surface to provide a holographic projection of a desired image wherein the reflector surface includes information that corresponds to an inverse of the holographic projection of the desired image. The substrate including the layer can be maintained in the path of the reflected radiation so that the holographic projection is projected onto the layer. Related systems are also discussed.

REFERENCES:
patent: 3582176 (1971-06-01), Mathisen
patent: 4325637 (1982-04-01), Moore
patent: 4498771 (1985-02-01), Makosch et al.
patent: 4614427 (1986-09-01), Koizumi et al.
patent: 4788116 (1988-11-01), Hochberg
patent: 5455850 (1995-10-01), Howells et al.
patent: 5568256 (1996-10-01), Korner et al.
patent: 5923423 (1999-07-01), Sawatari et al.
patent: 5973807 (1999-10-01), Buchkremer et al.
patent: 6730443 (2004-05-01), Herr et al.
patent: 2221353 (1990-01-01), None
patent: 03-295408 (1991-12-01), None
patent: 06-283585 (1994-10-01), None
patent: 09-016062 (1997-01-01), None
patent: 11-329944 (1999-11-01), None
V. Georges et al;Images charged objects using low-energy-electron coherent beams,Ultramicroscopy 90 (2001) pp 32-38.
Palmer et al., “Diffraction gratings,” Rep. Prog. Phys., vol.. 38, 1975, pp. 975-1048.
Microchannel Plate (MCP), http://www.hpk.co.jp/eng/products/ETD/mcpe/mcpe.htm, Mar. 28, 2003, 2 pages.
Microchannel Plate Principles of Operation, http://hea-www.harvard.edu/HRC/mcp/mcp.html, Mar. 28, 2003, 4 pages.
Skala, Melissa, Imaging X-Ray Fluorescence Using Microchannel Plate (MCP) Optics, Physics Department, Washington State University, Pullman, WA 99163, no date, 10 pages.
A Well Collimated Quasi-Continuous Atom Laser, http://physics.nist.gov/Divisions/Div842/Gp4/AtomOptics/intro.html, May 26, 2003, 2 pages.
Module 1-4 Properties of Light, http://www.dewtronics.com/tutorials/lasers/leot/course01—mod04/mod01-04.htm, May 26, 2003, 32 pages.
E. Hecht: “Optics” 1987, Addison-Wesley XP002184727, p. 593-596.
Anonymous: “Wafer Conformable Mask Image”, Research Disclosure (Dec. 1984) p. 609 XP002184726.
C. Jacobsen et al; “Projection X-Ray Lithography Using Computer-Generated Holograms: A study of compatibility with proximity lithography”; Journal of Vacuum Science and Technology: Part B, Am Inst. of Physics, New York, US vol. 10. No. 6 (Nov. 1, 1992) pp. 3177-3181 XP00332529.
C. Jacobsen et al; “X-Ray Holographic Microscopy Using Photoresists”, Journal of the Optical Society of America—A, Optical Society of America, Wash. US. vol. 7, No. 10 (Oct. 1, 1990) pp. 1847-1861 XP000163095.
Elliott, “Integrated Circuit Manufacturing Technology”, pp 76-81 (1982).
Machine translation of Tetsuo et al., JP 11-329944.
Machine translation of Tetsuo et al., JP 06-283585.
J.C.H. Spence et al;Low Energy Point Reflection Microscopy,Surface Review and Letters, vol. 4, No. 3 (1997) pp 577-587.
J.C.H. Spence et al;On the reconstruction of low voltage point projection holograms;Electron Holography, (1995) pp 267-276.
Hans-Werner Fink et al;State of the Art Low-Energy Electron Holography,Electron Holography (1995) pp 257-266.
J.C.H. Spence et al;Electron Holography at Low Energy,Introduction to Electron Holography, pp 311-331.
D.C. Joy et al;Advanced SEM Imaging,Characterization and Metrology fur ULSI Technology; 1998 International Conference, pp 653-666.
Russel Young et al;The Topografiner: An Instrument for Measuring Surface Microtopography,Review of Scientific Instruments, vol. 43, No. 7, (Jul. 1972) pp 999-1011.
G. Morton et al;Point Projector Electron Microscope,Phy. Rev. vol. 56, 705 (1939).

Affiliated with

Also associated with

Rating

Patterning methods and systems using reflected interference... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Patterning methods and systems using reflected interference..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Patterning methods and systems using reflected interference... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3509561