Patterning method, patterning apparatus, patterning...

Details Patterning method, patterning apparatus, patterning... Patterning method, patterning apparatus, patterning...

2007-12-11

2007-12-11

Alanko, Anita (Department: 1765)

Etching a substrate: processes

Forming or treating mask used for its nonetching function

C216S027000, C216S041000, C216S049000, C216S056000, C029S025350, C430S313000, C430S314000, C430S315000, C430S316000, C430S317000, C430S320000

Reexamination Certificate

active

10424790

ABSTRACT:
A template1is brought close to or in contact with a surface to be patterned111and patterns are formed with liquid62on the surface111. This method comprises the steps of: bringing the template1close to or essentially in contact with the surface111, supplying liquid62to a plurality of through holes12established in the pattern transfer region10of the template1for supplying the liquid62, and separating the template1from the surface111after the liquid62is adhered to the surface111via the through holes12.

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