Patterning method employing laser

Radiation imagery chemistry: process – composition – or product th – Stripping process or element – Forming nonplanar image

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430 7, 430262, 430272, 430321, 430945, G03F 900

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active

054016169

ABSTRACT:
A patterning method includes the steps of irradiating an excimer laser beam to a material layer so as to form a pattern on the material layer; and transferring onto a substrate, the material layer formed with the pattern; and irradiating the excimer laser beam to the material layer transferred onto the substrate so as to form a further pattern on the material layer.

REFERENCES:
patent: 3721557 (1973-03-01), Inoue
patent: 3904411 (1975-09-01), Erickson et al.
patent: 4716270 (1987-12-01), Gnanamuthu et al.
patent: 5104773 (1992-04-01), Ahne et al.
patent: 5227276 (1993-07-01), Roeschert et al.
patent: 5290665 (1994-03-01), Kii et al.

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